INSPECTION METHOD IN MANUFACTURING METHOD OF ELECTROPHOTOGRAPHIC PHOTORECEPTOR

PROBLEM TO BE SOLVED: To provide an inspection method in a manufacturing method of an electrophotographic photoreceptor, the method capable of accurately determining, as a defect, film thickness unevenness of a second intermediate layer of the electrophotographic photoreceptor and a remnant film whe...

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Main Authors MARUYAMA AKIHIRO, OKUDA ATSUSHI, FUJII JUNJI, SAKUMA KAZUKO, YAMAMOTO YUKI, ISHIZUKA YUKA, NAKAMURA NOBUHIRO
Format Patent
LanguageEnglish
Japanese
Published 08.06.2017
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Summary:PROBLEM TO BE SOLVED: To provide an inspection method in a manufacturing method of an electrophotographic photoreceptor, the method capable of accurately determining, as a defect, film thickness unevenness of a second intermediate layer of the electrophotographic photoreceptor and a remnant film when part of the second intermediate layer is removed after applying the second intermediate layer.SOLUTION: An inspection method is used in a manufacturing method of an electrophotographic photoreceptor having a support medium, a first intermediate layer, a second intermediate layer, a charge generating layer and a surface layer in this order. The surface roughness (Rz) of the second intermediate layer/the surface roughness (Rz) of the first intermediate layer satisfies ≤0.9. The inspection method has an inspection step of inspecting a defect of the electrophotographic photoreceptor by an intensity difference of light detected, through irradiating the electrophotographic photoreceptor with light having a peak in a wavelength of 620-830 nm and the half band width of the peak being 10 nm or more, and detecting the light of 550-830 nm from among the reflectance of the light on the electrophotographic photoreceptor.SELECTED DRAWING: None 【課題】電子写真感光体の第二中間層の膜厚ムラや第二中間層を塗布した後に第二中間層の一部を剥離した場合の膜残りを精度よく欠陥として判断できる電子写真感光体の製造方法における検査方法を提供する。【解決手段】支持体、第一中間層、第二中間層、電荷発生層、表面層をこの順に有し、第二中間層の表面粗さ(Rz)/第一中間層の表面粗さ(Rz)≦0.9であり、該電子写真感光体に、620nm以上、830nm以下の波長にピークを有し、かつ該ピークの半値幅が10nm以上である光を照射し、該電子写真感光体に照射した光の反射光のうち、550nm以上、830nm以下の光を検出し、該検出された光の強度差により、電子写真感光体の欠陥の有無を検査する検査工程を有することを特徴とする電子写真感光体の製造方法における検査方法。【選択図】なし
Bibliography:Application Number: JP20150233599