OPTICAL LAMINATE FILM AND METHOD FOR MANUFACTURING THE SAME, POLARIZING PLATE AND LIQUID CRYSTAL DISPLAY DEVICE

PROBLEM TO BE SOLVED: To provide an optical film that has good durability and can suppress decrease in the contrast of a liquid crystal display device.SOLUTION: The optical film has a modified region including a roughened surface. The optical film comprises a cycloolefin resin and at least one of a...

Full description

Saved in:
Bibliographic Details
Main Authors INOYA HIROSHI, KASAHARA MUTSUMI, KUBOTA SHIN, NANJO TAKASHI, AKASAKA KAZUKI
Format Patent
LanguageEnglish
Japanese
Published 01.06.2017
Subjects
Online AccessGet full text

Cover

Loading…
More Information
Summary:PROBLEM TO BE SOLVED: To provide an optical film that has good durability and can suppress decrease in the contrast of a liquid crystal display device.SOLUTION: The optical film has a modified region including a roughened surface. The optical film comprises a cycloolefin resin and at least one of a UV ray absorbent and an antioxidant. In a cross section perpendicular to the surface of the optical film, a total content Ms of the UV ray absorbent and the antioxidant in a region S from the roughened surface to a position of 0.1×t in a thickness direction, and a total content Mc of the UV ray absorbent and the antioxidant in a region C from the center of the optical film to positions of ±0.1×t in the thickness direction (where t represents the thickness of the optical film) satisfy that Mc/Ms is 0.01 or more and less than 1; a residual solvent amount included in the optical film is 100 ppm or more and 2000 ppm or less; and a ratio of (internal haze):(external haze) is from 1:15 to 1:1000.SELECTED DRAWING: Figure 1 【課題】良好な耐久性を有し、且つ液晶表示装置のコントラストの低下を抑制し得る光学フィルムを提供する。【解決手段】粗化された表面を含む改質領域を有する光学フィルムであって、前記光学フィルムは、シクロオレフィン系樹脂と、紫外線吸収剤及び酸化防止剤の少なくとも一方とを含み、前記光学フィルムの表面に垂直な切断面において、前記粗化された表面から厚み方向に0.1tの位置までの領域Sにおける前記紫外線吸収剤及び前記酸化防止剤の合計含有量をMs、前記光学フィルムの中心から厚み方向に±0.1tの位置までの領域Cにおける前記紫外線吸収剤及び前記酸化防止剤の合計含有量をMcとしたとき(前記光学フィルムの厚みをtとする)、Mc/Msが0.01以上1未満であり、前記光学フィルムに含まれる残留溶媒量が、100ppm以上2000ppm以下であり、且つ内部ヘイズ:外部ヘイズ=1:15〜1:1000である。【選択図】図1
Bibliography:Application Number: JP20150231919