METHOD AND SYSTEM OF EVALUATING TRANSCRIPTION PROPERTIES OF PHOTOMASK, AND METHOD OF MANUFACTURING PHOTOMASK

• Main Authors: HAYANO KATSUYA, KOSUGE TAKESHI, YOSHIKAWA SHINGO
• Format: Patent
• Language: English; Japanese
• Published: 23.03.2017
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

PROBLEM TO BE SOLVED: To provide an evaluation method and an evaluation system enabling accurate evaluation of transcription properties of a photomask for multi-patterning, and a manufacturing method enabling to manufacture a photomask having high reliability.SOLUTION: Among N (N is an integer equal to or larger than 2) sheets of photomasks that constitute one layer, a transcription exposure result due to photolithography of n (n is an integer equal to or larger than 1 and equal to or smaller than (N-1)) sheets of photomasks is obtained by simulation from pattern design data of the photomask, and a transcription exposure result due to the photolithography of other photomasks excluding the n sheets is obtained from a pattern obtained by photographing the photomask with a lithography simulation microscope, and thus obtained transcription exposure results are superposed to evaluate.SELECTED DRAWING: Figure 1 【課題】 マルチパターニング用のフォトマスクの転写特性の正確な評価を可能とする評価方法、評価システム、および、信頼性の高いフォトマスクの製造を可能とする製造方法を提供する。【解決手段】 １つの層を構成するパターンをＮ枚（Ｎは２以上の整数）のフォトマスクの中で、ｎ枚（ｎは１以上、（Ｎ−１）以下の整数）のフォトマスクのフォトリソグラフィによる転写露光結果を、当該フォトマスクのパターン設計データからシミュレーションにより求め、上記ｎ枚を除いた他のフォトマスクのフォトリソグラフィによる転写露光結果を、当該フォトマスクをリソグラフィシミュレーション顕微鏡にて撮像したパターンから求め、このように求めた転写露光結果を重ね合わせて評価を行う。【選択図】 図１