ILLUMINATION SYSTEM OF MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

PROBLEM TO BE SOLVED: To provide an illumination system of a microlithographic projection exposure apparatus, which can adjust both spatial and angular irradiance distribution in a field dependent manner.SOLUTION: An optical integrator 60 comprises a plurality of light entrance facets each being ass...

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Bibliographic Details
Main Authors DEGUENTHER MARKUS, THOMAS KORB, FRANK SCHLESENER, STEGANIE HILT, VLADIMIR DAVYDENKO, WOLFGANG HOEGELE
Format Patent
LanguageEnglish
Japanese
Published 16.03.2017
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:PROBLEM TO BE SOLVED: To provide an illumination system of a microlithographic projection exposure apparatus, which can adjust both spatial and angular irradiance distribution in a field dependent manner.SOLUTION: An optical integrator 60 comprises a plurality of light entrance facets each being associated with one of secondary light sources. A spatial light modulator 52 has a light exit surface 57 and transmits or reflects impinging projection light in a spatially resolved manner. A pupil forming unit 36 directs projection light on the spatial light modulator. An objective 58 images the light exit surface 57 of the spatial light modulator onto the light entrance facets of the optical integrator 60. A control unit controls the pupil forming unit 36 and the spatial light modulator 52. The light exit surface of the optical light modulator 52 comprises groups of object areas being separated by areas that are not imaged on the light entrance facets. The objective 58 combines images of the object areas so that the images of the object areas abut on the optical integrator.SELECTED DRAWING: Figure 3 【課題】空間放射照度分布と角度放射照度分布の両方を視野依存方式で調節することができるマイクロリソグラフィ投影露光装置の照明系を提供する。【解決手段】光学インテグレーター６０は各々が２次光源のうちの１つに関連付けられた複数の光入射ファセットを含む。空間光変調器５２は光射出面５７を有し入射投影光を空間分解方式で透過又は反射するように構成される。瞳形成ユニット３６は投影光を空間光変調器上に向けるように構成される。対物系５８は空間光変調器の光射出面５７を光学インテグレーター６０の光入射ファセット上に結像する。制御ユニットは瞳形成ユニット３６及び空間光変調器５２を制御するように構成される。光学光変調器５２の光射出面は光入射ファセット上に結像されない区域によって分離された物体区域グループを含む。対物系５８は物体区域の像が光学インテグレーター上に当接するように組み合わせる。【選択図】図３
Bibliography:Application Number: JP20160210859