LITHOGRAPHIC APPARATUS

PROBLEM TO BE SOLVED: To reduce image distortion due to temperature gradients in a substrate and an immersion liquid in an immersion projection exposure apparatus.SOLUTION: An immersion lithography apparatus comprises a temperature controller configured to adjust the temperature of a final element o...

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Bibliographic Details
Main Authors STRAAIJER ALEXANDER, ANTONIUS THEODORUS ANNA MARIA DERKSEN, STREEFKERK BOB, JOERI LOF, SIMON KLAUS
Format Patent
LanguageEnglish
Japanese
Published 16.03.2017
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:PROBLEM TO BE SOLVED: To reduce image distortion due to temperature gradients in a substrate and an immersion liquid in an immersion projection exposure apparatus.SOLUTION: An immersion lithography apparatus comprises a temperature controller configured to adjust the temperature of a final element of a projection exposure apparatus PL, a substrate and an immersion liquid to a common target temperature T4. Adjusting the temperature of these elements and reducing temperature gradients improves imaging consistency and general performance. Means used includes controlling the immersion liquid flow rate and temperature via a feedback circuit.SELECTED DRAWING: Figure 4 【課題】液浸投影露光装置において、基板および浸漬液の温度勾配による画像のゆがみを減じる。【解決手段】投影露光装置ＰＬの最終段の部材、基板および浸漬液体の温度を共通の目標温度Ｔ４に調整する温度制御器を含む浸漬リトグラフ装置であって、これら構成部材の全温度を調整し、温度勾配を減少させることで、画像形成の整合性と全体的性能を向上させる。使用する手段は、フィードバック回路によって浸漬液の流速および温度を制御することを含む。【選択図】図４
Bibliography:Application Number: JP20160209558