IMAGE PROCESSOR OF SEMICONDUCTOR PATTERN IMAGE
PROBLEM TO BE SOLVED: To provide an image processor capable of performing matching processing having high robustness regardless of positional deviation, deformation or the like of a pattern included in a high density pattern.SOLUTION: An image processor is proposed. The image processor calculates a...
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Main Authors | , , |
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Format | Patent |
Language | English Japanese |
Published |
09.03.2017
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Subjects | |
Online Access | Get full text |
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Summary: | PROBLEM TO BE SOLVED: To provide an image processor capable of performing matching processing having high robustness regardless of positional deviation, deformation or the like of a pattern included in a high density pattern.SOLUTION: An image processor is proposed. The image processor calculates a matching result between a pattern and reference data on the basis of a comparison between a feature amount acquired by calculating the curvature of a specific portion of an edge of the pattern extracted from an image to be retrieved and a feature amount extracted from the reference data, or a comparison between classification information to be allocated in accordance with the feature amount of the specific portion of the edge extracted from the image and classification information extracted from the reference data.SELECTED DRAWING: Figure 1
【課題】本発明は、高密度パターンに含まれるパターンの位置ずれや変形等によらず、ロバスト性の高いマッチング処理が可能な画像処理装置の提供を目的とする。【解決手段】本発明は、被探索画像から抽出されるパターンのエッジの特定部位の曲率を演算することによって、求められる特徴量と、基準データから抽出される特徴量との比較、或いは画像から抽出されるエッジの特定部位の特徴量に応じて割り当てられる分類情報と、基準データから抽出される分類情報との比較に基づいて、パターンと基準データとの間のマッチング結果を演算する画像処理装置を提案する。【選択図】 図1 |
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Bibliography: | Application Number: JP20150169977 |