DEVELOPMENT DEVICE

• Main Authors: IIDA TAKANORI, ISHIDA YUSUKE
• Format: Patent
• Language: English; Japanese
• Published: 23.02.2017
• Subjects: CINEMATOGRAPHY; ELECTROGRAPHY; ELECTROPHOTOGRAPHY; HOLOGRAPHY; MAGNETOGRAPHY; PHOTOGRAPHY; PHYSICS

PROBLEM TO BE SOLVED: To provide a structure capable of suppressing residence of a developer on a part where heights of bottom surfaces of an opening 44b and a transport path 49 are different.SOLUTION: A transport screw 46a transports a developer to a first direction (arrow γ direction) and a return screw 46b disposed on a downstream side of the first direction of the transport screw 46a transports the developer to a second direction being opposite to the first direction. An opening 44b for discharging a surplus developer in a development container is provided on an end face 44a on the first direction downstream side of a transport path 49 where the transport screw 46a is provided. The opening 44b is provided on a position where is higher than a bottom surface of a facing area where the transport screw 46a of the transport path 49 faces. In an area between a second direction upstream end part of the return screw 46b and the end face 44a, a step part 57 where a height of a bottom surface of the development container is higher than the bottom surface of the facing area, is provided.SELECTED DRAWING: Figure 9 【課題】開口部４４ｂと搬送経路４９との底面の高さが異なる部分での現像剤の滞留を抑制できる構造を実現する。【解決手段】搬送スクリュー４６ａは、第１方向（矢印γ方向）に現像剤を搬送し、搬送スクリュー４６ａの第１方向下流側に設けられた返しスクリュー４６ｂは、第１方向と逆方向である第２方向に現像剤を搬送する。搬送スクリュー４６ａが設けられた搬送経路４９の第１方向下流側の端面４４ａに現像容器内の余剰な現像剤を排出する開口部４４ｂが設けられている。開口部４４ｂは、搬送経路４９の搬送スクリュー４６ａが対向する対向領域の底面よりも高い位置にある。返しスクリュー４６ｂの第２方向上流端部と端面４４ａとの間の領域において、現像容器の底面高さが上述の対向領域の底面よりも高くなる段差部５７を設ける。【選択図】図９