PHOTOSENSITIVE COPOLYMER, PHOTORESIST COMPOSITION COMPRISING COPOLYMER, AND ARTICLE FORMED THEREFROM

• Main Authors: ONGAYI OWENDI, THACKERAY JAMES W
• Format: Patent
• Language: English; Japanese
• Published: 23.02.2017
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; ELECTROGRAPHY; HOLOGRAPHY; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS; MATERIALS THEREFOR; METALLURGY; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; THEIR PREPARATION OR CHEMICAL WORKING-UP

PROBLEM TO BE SOLVED: To provide a photoresist suitable for EUV (extreme ultraviolet rays) photoresist development, and a photosensitive copolymer for the photoresist.SOLUTION: A copolymer is provided, which is a copolymer of an electron-sensitizing acid deprotectable monomer represented by formula (XX) and a comonomer; and a photoresist comprising the copolymer is provided. In the formula, Rand Reach independently represent a substituted/unsubstituted alkyl group having 1 to 10 carbon atoms or a cycloalkyl group having 3 to 10 carbon atoms; Rrepresents a substituted/unsubstituted aromatic-containing group or cyclic aliphatic-containing group having 6 to 20 carbon atoms; Rand Rmay form a ring; and at least one in R, Rand Ris halogenated.SELECTED DRAWING: Figure 1 【課題】ＥＵＶ（極紫外線）ホトレジスト現像に適したホトレジスト、そのための感光性コポリマーの提供。【解決手段】式（ＸＸ）で表される電子感受性酸脱保護性モノマーと、コモノマーとの共重合体、該共重合体を含むフォトレジスト。（Ｒｘ及びＲｙは夫々独立に置換／非置換Ｃ１−１０アルキル基又はＣ３−１０シクロアルキル基；Ｒｚは置換／非置換Ｃ６−２０芳香族含有基又は環式脂肪族含有基；Ｒｘ及びＲｙは環を形成しても良く；Ｒｘ、Ｒｙ及びＲｚの少なくとも１つはハロゲン化されている）【選択図】図１