RESIST REMOVER AND RESIST REMOVING METHOD

• Main Authors: NARUSE SHINGO, MORITA SHIRO
• Format: Patent
• Language: English; Japanese
• Published: 02.02.2017
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

PROBLEM TO BE SOLVED: To provide a resist remover containing substantially no water, which exhibits excellent decomposing property for a resist and induces little corrosion in metal.SOLUTION: The resist remover contains substantially no water and contains a quaternary ammonium hydroxide by 2 to 10 mass%, glycols, and an amide-based organic solvent. The content (mass) of the glycols is 5 times or more the content (mass) of the quaternary ammonium hydroxide.SELECTED DRAWING: None 【課題】実質的に水を含まないレジスト除去剤において、レジストの分解性にすぐれ、且つ、金属への腐食が少ないレジスト除去剤の提供。【解決手段】実質的に水を含有しないレジスト除去剤であって、第４級アンモニウム水酸化物を２〜１０質量％、グリコール類、およびアミド系有機溶剤を含有し、前記グリコール類の含有量（質量）が、前記第４級アンモニウム水酸化物の含有量（質量）の５倍以上であることを特徴とするレジスト除去剤。【選択図】なし