SPUTTERING TARGET

• Main Authors: IINO MINORU, KAWAGUCHI YUKIO, KIUCHI KENICHI
• Format: Patent
• Language: English; Japanese
• Published: 19.01.2017
• Subjects: ARTIFICIAL STONE; BASIC ELECTRIC ELEMENTS; CEMENTS; CERAMICS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDINGMATERIALS; CONCRETE; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; LIME, MAGNESIA; METALLURGY; REFRACTORIES; SLAG; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; TREATMENT OF NATURAL STONE

PROBLEM TO BE SOLVED: To provide a sputtering target which is hardly broken during DC sputtering, even when a thickness is enlarged.SOLUTION: In a sputtering target, a perovskite type oxide which is a main component, obtained by molding raw material powder for the perovskite type oxide by an isotropic pressurization method of 100-500 MPa without containing a binder, and by cutting it into a prescribed size, has a crystal grain diameter of 11-15 μm, a deflective strength of 60 MPa or higher, an electric resistance value of 0.01-10 Ω-cm, a heat conductivity of 3-12 W/mK, and a thickness of 7-10 mm.SELECTED DRAWING: Figure 1 【課題】厚さを大きくしてもＤＣスパッタリング中に割れにくいスパッタリングターゲットの提供。【解決手段】ペロブスカイト型酸化物の原料粉末をバインダを含まずに１００〜５００ＭＰａの等方圧加圧法で成形し、所定の大きさに切断した、主成分のペロブスカイト型酸化物の結晶粒子径が１１〜１５μｍであり、抗折強度が６０ＭＰａ以上で、電気抵抗値が０．０１〜１０Ωｃｍで、熱伝導率が３〜１２Ｗ/ｍＫで、厚さ７〜１０ｍｍのスパッタリングターゲット。【選択図】図１