JOINT DEVICE, JOINT SYSTEM, JOINT METHOD, PROGRAM AND COMPUTER STORAGE MEDIUM
PROBLEM TO BE SOLVED: To achieve appropriate joint processing between substrates to be jointed by appropriately adjusting a horizontal position between substrates to be jointed.SOLUTION: The joint device includes: an upper chuck 140 sucking and retaining an upper wafer Wonto a lower surface by vacuu...
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Main Authors | , , , , |
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Format | Patent |
Language | English Japanese |
Published |
05.01.2017
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Subjects | |
Online Access | Get full text |
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Summary: | PROBLEM TO BE SOLVED: To achieve appropriate joint processing between substrates to be jointed by appropriately adjusting a horizontal position between substrates to be jointed.SOLUTION: The joint device includes: an upper chuck 140 sucking and retaining an upper wafer Wonto a lower surface by vacuuming; a lower chuck 141 provided below the upper chuck 140 and sucking and retaining a lower wafer Wonto an upper surface. The lower chuck 141 includes a placement part 200 which has the lower wafer Wthereon and can make a telescopic motion in the vertical and horizontal directions; and a deformation mechanism 210 pressing the placement part 200 from downward for deformation so that a height of the central part of the placement part 200 is more than that of a peripheral part thereof.SELECTED DRAWING: Figure 6
【課題】接合される基板同士の水平方向位置を適切に調節し、当該基板同士の接合処理を適切に行う。【解決手段】接合装置は、下面に上ウェハWUを真空引きして吸着保持する上チャック140と、上チャック140の下方に設けられ、上面に下ウェハWLを真空引きして吸着保持する下チャック141と、を有する。下チャック141は、下ウェハWLを載置し、鉛直方向及び水平方向に伸縮自在の載置部200と、載置部200において中心部の高さが外周部の高さより高くなるように、当該載置部200を下方から押圧して変形させる変形機構210と、を有する。【選択図】図6 |
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Bibliography: | Application Number: JP20150120801 |