SUBSTRATE AND METHOD OF MANUFACTURING CIRCUIT BOARD

PROBLEM TO BE SOLVED: To keep conductivity required for electrolytic plating even if a plurality of resist formations and resist removals are performed.SOLUTION: A substrate has a conductive thin film 10 composed of two or more layers on the upper surface of an insulation substrate 21. The uppermost...

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Bibliographic Details
Main Authors HIGASHIYAMA MASASHI, TAKEMORI HIDEAKI, NAKAJIMA TAKASHI
Format Patent
LanguageEnglish
Japanese
Published 05.01.2017
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Summary:PROBLEM TO BE SOLVED: To keep conductivity required for electrolytic plating even if a plurality of resist formations and resist removals are performed.SOLUTION: A substrate has a conductive thin film 10 composed of two or more layers on the upper surface of an insulation substrate 21. The uppermost layer Ti out of a plurality of layers in this conductive thin film 10 is a second Ti thin film 13. Metal having conductivity of at least Ni or more is provided under the second Ti thin film 13, concretely a metal thin film 12 which is a layer constituted by Cu, Ag and Ni is provided.SELECTED DRAWING: Figure 1 【課題】複数回のレジスト形成・レジスト除去を行っても、電解めっきに必要な導電性を保つことができることを課題とする。【解決手段】絶縁基板21の上面に、2つ以上の層からなる導電性薄膜10を有し、この導電性薄膜10における複数の層のうち、最も上の層がTiによって形成される第2Ti薄膜13であり、第2Ti薄膜13の下に、少なくともNi以上の導電性を有する金属、具体的には、Cu、Ag及びNiで構成される層である金属薄膜12を有することを特徴とする。【選択図】図1
Bibliography:Application Number: JP20150115748