CATADIOPTRIC PROJECTION OBJECTIVE SYSTEM

PROBLEM TO BE SOLVED: To provide a catadioptric projection objective system suitable for use in a vacuum ultraviolet range, which has potential for a very high image-side numerical aperture that may reach values that enable immersion lithography at numerical apertures NA>1.SOLUTION: A catadioptri...

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Main Authors DODOC AURELIAN, ULRICH WILHELM, EPPLE ALEXANDER, SUZANNE BEDELL, BUENAU RUDOLF VON, WOLFGANG ZIEGLER, MANN HANS-JUERGEN, SHAFER DAVID
Format Patent
LanguageEnglish
Japanese
Published 28.12.2016
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:PROBLEM TO BE SOLVED: To provide a catadioptric projection objective system suitable for use in a vacuum ultraviolet range, which has potential for a very high image-side numerical aperture that may reach values that enable immersion lithography at numerical apertures NA>1.SOLUTION: A catadioptric projection objective lens is for forming an image of a pattern provided in an object plane of a projection objective lens onto an image plane of a projection objective system and includes: a first refractive objective lens part for imaging the pattern provided in the object plane into a first intermediate image; a second objective lens part having at least one concave mirror for imaging the first intermediate image into a second intermediate image; and a third refractive objective lens part for imaging the second intermediate imaging onto the image plane. The projection objective system is configured such that the projection objective lens has a maximum lens diameter D, a maximum image field height Y' and an image-side numerical aperture NA, and satisfies a condition COMP1<10, where COMP1 equals to D/(Y'×NA).SELECTED DRAWING: Figure 1 【課題】開口数ＮＡ＞１で液浸リソグラフィを可能にする値に達し得る非常に高い像側開口数の可能性を有する、真空紫外領域での使用に適したカタディオプトリック投影対物系を提供する。【解決手段】投影対物レンズの物体平面に設けられたパターンを投影対物系の像平面上に結像するためのカタディオプトリック投影対物レンズが、物体平面に設けられたパターンを第１中間像に結像するための第１屈折対物レンズ部分と、第１中間像を第２中間像に結像するための少なくとも１つの凹面鏡を有する第２対物レンズ部分と、第２中間像を像平面上に結像するための第３屈折対物レンズ部分を有し、投影対物レンズが最大レンズ直径Ｄmax、最大像視野高さＹ'、及び像側開口数ＮＡを有し、ＣＯＭＰ１＝Ｄmax／（Ｙ'・ＮＡ2）であり、条件ＣＯＭＰ１＜１０が当てはまる、カタディオプトリック投影対物系。【選択図】図１
Bibliography:Application Number: JP20160171601