SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SEMICONDUCTOR DEVICE

• Main Author: SAKUMA HITOSHI
• Format: Patent
• Language: English; Japanese
• Published: 15.12.2016
• Subjects: BASIC ELECTRIC ELEMENTS; DEVICES USING STIMULATED EMISSION; ELECTRICITY

PROBLEM TO BE SOLVED: To provide a semiconductor device manufacturing method and a semiconductor device, which can form a narrow mesa stripe and furthermore prevent a substrate from cracking around grooves on both sides of the mesa stripe.SOLUTION: A semiconductor device manufacturing method compris...