IMPRINT DEVICE, IMPRINT METHOD AND MANUFACTURING METHOD FOR ARTICLE

• Main Author: TERAO TSUTOMU
• Format: Patent
• Language: English; Japanese
• Published: 01.12.2016
• Subjects: AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING; BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; PERFORMING OPERATIONS; SEMICONDUCTOR DEVICES; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR; SHAPING OR JOINING OF PLASTICS; TRANSPORTING; WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL

PROBLEM TO BE SOLVED: To provide an imprint device advantageous for detecting a foreign matter existing between a mold and a substrate.SOLUTION: An imprint device performing imprint processing for patterning an imprint material on a substrate by using a mold, has an imaging section for imaging the substrate and acquiring an image, and a processing section performing detection processing for detecting a foreign matter existing between the mold and the substrate. The processing section performs detection processing by comparing an image, acquired by the imaging section in a state where the mold is in contact with the imprint material on the substrate, with a reference image.SELECTED DRAWING: Figure 6 【課題】モールドと基板との間に存在する異物を検出するのに有利なインプリント装置を提供する。【解決手段】基板上のインプリント材にモールドを用いてパターンを形成するインプリント処理を行うインプリント装置であって、前記基板を撮像して画像を取得する撮像部と、前記モールドと前記基板との間に存在する異物を検出する検出処理を行う処理部と、を有し、前記処理部は、前記モールドと前記基板上のインプリント材とが接触している状態で前記撮像部によって取得された画像と、基準画像とを比較することで、前記検出処理を行うことを特徴とするインプリント装置を提供する。【選択図】図６