SUBSTRATE HEATING DEVICE

• Main Authors: SHIMAMURA AKINORI, AMADA SHINYA, OIKAWA JUNJI, OSHIMA KIYOMI, HAYASHI TERUYUKI
• Format: Patent
• Language: English; Japanese
• Published: 24.11.2016
• Subjects: BLASTING; DRYING; DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM; HEATING; LIGHTING; MECHANICAL ENGINEERING; WEAPONS

PROBLEM TO BE SOLVED: To provide a substrate heating device that can evenly heat each substrate in a stable manner.SOLUTION: The substrate heating device 10 includes: a storage chamber 11 in which a heating gas is present; and multiple heating units 12 for heating a glass substrate G. The multiple heating units 12 are arranged in the storage chamber 11 so as to be separated from one another in parallel to one another while overlapping in a vertical direction. Each heating unit 12 has a heating chamber 18 for storing the glass substrate G and a unit fan 19 for introducing a heated gas into the heating chamber 18.SELECTED DRAWING: Figure 2 【課題】各基板を安定して均一に加熱することができる基板加熱装置を提供する。【解決手段】基板加熱装置１０は、内部に加熱ガスが存在する収容室１１と、ガラス基板Ｇを加熱する複数の加熱ユニット１２とを備え、複数の加熱ユニット１２は収容室１１の内部において互いに平行且つ離間し、且つ上下方向に関して重畳されるように配置され、各加熱ユニット１２は、ガラス基板Ｇを収容する加熱室１８と、該加熱室１８の内部に加熱されたガスを導入するユニットファン１９とを有する。【選択図】図２