SURFACE-TREATED ALUMINUM MATERIAL AND METHOD FOR PRODUCING THE SAME

• Main Authors: MURANAKA TAKEHIKO, MAE HIDEO, KAWAMOTO ISAO
• Format: Patent
• Language: English; Japanese
• Published: 17.11.2016
• Subjects: APPARATUS THEREFOR; CHEMISTRY; ELECTROFORMING; ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; METALLURGY; PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS

PROBLEM TO BE SOLVED: To provide a dense surface-treated aluminum material excellent in the suppression capacity of corrosion resistance, wear resistance and outgas to corrosive chlorine gas and plasma introduced into a vacuum device such as a CVD device and a PVD device and an etching device for a semiconductor device, capable of achieving to a prescribed vacuum degree at a high speed and capable of suppressing the generation of contaminants owing to the increase of etching resistance by providing high flatness in film thickness in addition to the denseness.SOLUTION: There is provided a surface-treated aluminum material comprising: an aluminum base material 2 made of aluminum or an aluminum alloy; an anode oxide film layer 3 formed on the surface of the aluminum base material 2; and a hydrated alumina film layer 4 formed on the anode oxide film layer 3, in which the film thickness of the hydrated alumina film layer 4 is 2 to 20 μm.SELECTED DRAWING: Figure 1 【課題】緻密で、ＣＶＤ装置やＰＶＤ装置等の真空装置内や半導体デバイス用のエッチング装置内に導入される腐食性の塩素ガスやプラズマに対する耐食性、耐摩耗性及びアウトガスの抑制能力に優れ、高速で所定の真空度に到達することができ、さらに、緻密に加えて膜厚で高い平滑性を備えることでエッチング耐性を高めて汚染物質の発生を抑制可能な表面処理アルミニウム材を提供する。【解決手段】 アルミニウム又はアルミニウム合金からなるアルミニウム基材２と、このアルミニウム基材２表面上に形成される陽極酸化皮膜層３と、この陽極酸化皮膜層３上に形成される水和アルミナ皮膜層４とを有し、水和アルミナ皮膜層４の膜厚が２μｍ以上２０μｍ以下の表面処理アルミニウム材である。【選択図】図１