TRANSPARENT CONDUCTIVE FILM AND METHOD FOR MANUFACTURING THE SAME

• Main Authors: YAMAMOTO YUSUKE, MACHINAGA HIRONOBU, SASA KAZUAKI
• Format: Patent
• Language: English; Japanese
• Published: 10.11.2016
• Subjects: BASIC ELECTRIC ELEMENTS; CABLES; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; CONDUCTORS; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; INSULATORS; LAYERED PRODUCTS; LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM; METALLURGY; PERFORMING OPERATIONS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING ORDIELECTRIC PROPERTIES; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; TRANSPORTING

PROBLEM TO BE SOLVED: To provide a transparent conductive film including, on an organic polymer film base, a transparent conductive membrane having a low specific resistance value and surface resistance value, having a small internal stress and consisting of a crystalline film.SOLUTION: The transparent conductive film has a transparent conductive membrane on at least one surface of an organic polymer film base. The transparent conductive membrane is a crystalline material film of indium based composite oxide having 7 to 15 wt.% of a rate of a tetravalent metal element oxide represented by {tetravalent metal element oxide/(tetravalent metal element oxide+indium oxide)}×100 (%), and has: a specific resistance value of 1.2×10to 2.0×10Ω cm; main peaks of X-ray diffraction peaks on (222) plane and (440) plane; less than 0.3 of a peak intensity ratio (I/I) of the peak intensity (I) of the (222) plane to the peak intensity (I) of the (440) plane; and 700 MPa or less of an internal stress measured by an X-ray stress measuring method.SELECTED DRAWING: Figure 1 【課題】有機高分子フィルム基材上に、低い比抵抗値及び表面抵抗値を有し、かつ内部応力が小さく結晶質膜からなる透明導電膜を有する透明導電性フィルムを提供すること。【解決手段】本発明の透明導電性フィルムは、有機高分子フィルム基材上の少なくとも一方の面に透明導電膜を有し、前記透明導電膜は、｛４価金属元素の酸化物／（４価金属元素の酸化物＋酸化インジウム）｝×１００（％）で表される４価金属元素の酸化物の割合が７〜１５重量％であるインジウム系複合酸化物の結晶質膜であり、比抵抗値が１．２×１０−４〜２．０×１０−４Ω・ｃｍであり、Ｘ線回折ピークの主ピークを（２２２）面と（４４０）面に有し、（２２２）面のピークの強度（Ｉ２２２）と（４４０）面のピークの強度（Ｉ４４０）のピーク強度比（Ｉ４４０／Ｉ２２２）が０．３未満であり、かつ、Ｘ線応力測定法による内部応力が、７００ＭＰａ以下である。【選択図】図１