HEATER BLOCK AND SUBSTRATE PROCESSING APPARATUS

• Main Authors: JEONG PIL SEONG, JI SANG-HYUN, HAN YONG WOO, LEE SONG YEON
• Format: Patent
• Language: English; Japanese
• Published: 04.11.2016
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC HEATING; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

PROBLEM TO BE SOLVED: To provide a heater block and a substrate processing apparatus.SOLUTION: The heater block includes a plurality of heating lamps mounted on one surface opposing to an object to be processed such as a substrate. The heating lamps includes: first lamps for irradiating the object to be processed with ultraviolet light (UV); and second lamps for irradiating the object to be processed with infrared light (IR). Ratios of relative numbers of the first lamps and the second lamps are different for a plurality of regions on one surface. The substrate processing apparatus includes the heater block. A temperature at a peripheral region of the substrate is compensated to improve uniformity of the substrate temperature.SELECTED DRAWING: Figure 2 【課題】ヒーターブロック及び基板処理装置を提供する。【解決手段】本発明は、処理物、例えば基板と相対する一方の面に複数の加熱ランプが取り付けられるヒーターブロックであって、加熱ランプは、処理物に紫外線（ＵＶ）を照射する第１のランプ及び処理物に赤外線（ＩＲ）を照射する第２のランプを含み、第１のランプ及び第２のランプの相対的な数の割合は、一方の面上の複数の領域のそれぞれにおいて異なるヒーターブロック及びこれを備える基板処理装置に関し、基板の周縁領域の温度を補償して基板温度の均一性を向上させるヒーターブロック及び基板処理装置が開示される。【選択図】図２