METHOD FOR MANUFACTURING SILICON CONTAINING POWDER
PROBLEM TO BE SOLVED: To provide a new method for manufacturing silicon containing powder using thermal plasma, capable of obtaining the silicon containing powder having spherical fine particles.SOLUTION: The method for manufacturing a silicon containing powder includes a DC plasma step of heating a...
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Main Authors | , , , |
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Format | Patent |
Language | English Japanese |
Published |
27.10.2016
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Subjects | |
Online Access | Get full text |
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Summary: | PROBLEM TO BE SOLVED: To provide a new method for manufacturing silicon containing powder using thermal plasma, capable of obtaining the silicon containing powder having spherical fine particles.SOLUTION: The method for manufacturing a silicon containing powder includes a DC plasma step of heating and ejecting raw powder containing silicon using direct-current thermal plasma. In the DC plasma step, a mixed gas of an argon (Ar) gas with a diatomic molecule gas or polyatomic molecule gas is used as a plasma gas. In the plasma gas, a mixed rate of the argon (Ar) gas with the diatomic molecule gas or polyatomic molecule gas is 99:1-10:90 in a flow ratio.SELECTED DRAWING: Figure 1
【課題】熱プラズマを利用してシリコン含有粉末を製造する方法に関し、微粒でかつ球状を呈するシリコン含有粉末を得ることができる、新たな方法の提供。【解決手段】シリコンを含む原料粉を、直流熱プラズマを利用して加熱噴射するDCプラズマ工程を備えたシリコン含有粉末の製造方法において、前記DCプラズマ工程では、プラズマガスとして、アルゴン(Ar)ガスと、二原子分子ガス又は多原子分子ガスとの混合ガスを使用するシリコン含有粉末の製造方法。前記プラズマガスにおいて、アルゴン(Ar)ガスと、二原子分子ガス又は多原子分子ガスとの混合割合が、流量比で99:1〜10:90であるシリコン含有粉末の製造方法。【選択図】図1 |
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Bibliography: | Application Number: JP20150066743 |