METHOD FOR MANUFACTURING DIAMOND FILM, HOT FILAMENT CVD APPARATUS AND MECHANICAL SEAL

• Main Authors: NAGASAKA HIROSHI, TSURUMI YUKI, MORI MINORU
• Format: Patent
• Language: English; Japanese
• Published: 13.10.2016
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; COMPOUNDS THEREOF; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; INORGANIC CHEMISTRY; METALLURGY; NON-METALLIC ELEMENTS; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

PROBLEM TO BE SOLVED: To provide a method for manufacturing a diamond film, capable of depositing the diamond film at a low cost.SOLUTION: The method for manufacturing a diamond film using a hot filament CVD apparatus including a film deposition chamber, a base material table, a filament to be heated and gas supply means comprises the steps of: arranging the base material on the base material table; supplying a raw material gas and a carrier gas into the film deposition chamber; and increasing the temperature of the filament to a predetermined temperature by energizing the filament. A ratio of the flow rate of the raw material gas to that of the carrier gas is set to be in a range of 5-23%.SELECTED DRAWING: Figure 5 【課題】 ダイヤモンド薄膜を低コストで成膜するための、ダイヤモンド薄膜の製造方法を得る。【解決手段】 熱フィラメントＣＶＤ装置を用いるダイヤモンド薄膜の製造方法であって、前記熱フィラメントＣＶＤ装置が、成膜室と、基材台と、加熱可能なフィラメントと、ガス供給手段とを含み、ダイヤモンド薄膜の製造方法が、前記基材台に前記基材を配置する工程と、前記成膜室内に前記原料ガス及び前記キャリアガスを供給する工程と、前記フィラメントに通電することにより、前記フィラメントを所定の温度まで上昇させる工程と、を含み、前記キャリアガスの流量に対する前記原料ガスの流量の比率が５〜２３％の範囲内となるように設定される、ダイヤモンド薄膜の製造方法である。【選択図】 図５