TRANSPARENT CONDUCTIVE FILM AND METHOD FOR MANUFACTURING THE SAME

• Main Authors: YAMAZAKI YUKA, MIYAZAKI TSUKASA, MACHINAGA HIRONOBU, MURAOKA YOKO, NASHIKI TOMOTAKE
• Format: Patent
• Language: English; Japanese
• Published: 13.10.2016
• Subjects: BASIC ELECTRIC ELEMENTS; CABLES; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; CONDUCTORS; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; INSULATORS; LAYERED PRODUCTS; LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM; METALLURGY; PERFORMING OPERATIONS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING ORDIELECTRIC PROPERTIES; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; TRANSPORTING

PROBLEM TO BE SOLVED: To provide a transparent conductive film excellent in beating characteristics and flexure resistance under a heavy load.SOLUTION: The transparent conductive film includes a transparent conductive layer 3 made of a crystalline indium-tin complex oxide formed on a flexible transparent substrate 1, in which the transparent conductive layer has a compressive residual stress of 0.4 to 2 GPa. The transparent conductive layer 3 may be obtained by heating an amorphous conductive layer made of an amorphous indium-tin complex oxide. In the heating, a compressive stress is preferably imparted to the transparent conductive layer. The dimensional change in the transparent conductive layer by the heating is preferably from -0.3% to -1.5% in at least one direction within the plane.SELECTED DRAWING: Figure 1 【課題】重荷重で打点特性および耐屈曲性に優れる透明導電性フィルムを提供する。【解決手段】可撓性透明基材１上に、結晶性のインジウム・スズ複合酸化物からなる透明導電層３が形成されており、透明導電層の圧縮残留応力が０．４〜２ＧＰａである透明導電性フィルム。透明導電層３は、非晶質のインジウム・スズ複合酸化物からなる非晶質透明導電層を加熱することにより得られうる。加熱の際には透明導電層に圧縮応力が付与されることが好ましい。また、加熱による透明導電層の寸法変化は、少なくとも面内の一方向において−０．３％〜−１．５％であることが好ましい。【選択図】図１