WAFER TRANSFER DEVICE

PROBLEM TO BE SOLVED: To provide a wafer transfer device capable of removing the dust, adhering to the front surface and/or back surface of the sample, in transfer process of the sample.SOLUTION: In a wafer transfer device including an arm (104) for transferring a wafer (4) of transfer object, and a...

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Bibliographic Details
Main Author INADA TOMOHIRO
Format Patent
LanguageEnglish
Japanese
Published 06.10.2016
Subjects
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