METHOD OF MANUFACTURING SUBSTRATE HAVING QUANTUM DOT STRUCTURE

• Main Authors: OBUSE HIROSHI, TOKOSHIMA HIROTO, LEE SHOYU, SAGAWA SEIJI, OKADA KEN
• Format: Patent
• Language: English; Japanese
• Published: 06.10.2016
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; NANOTECHNOLOGY; PERFORMING OPERATIONS; SEMICONDUCTOR DEVICES; SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; TRANSPORTING

PROBLEM TO BE SOLVED: To provide a method of manufacturing a substrate having a quantum dot structure, in which an oxide coating can be easily and inexpensively formed on the substrate surface from which a natural oxide film is removed and the scale-up is also easily performed.SOLUTION: Disclosed is a method of manufacturing a substrate having a quantum dot structure, which includes: an oxidation step of performing oxidation treatment on a substrate surface from which a natural oxide film is removed; and a coating step of coating a particulate protein suspension solution and two-dimensionally arranging protein particles on the substrate. The oxidation step is performed by bringing oxidant substance containing liquid into contact with the substrate.SELECTED DRAWING: None 【課題】自然酸化膜を除去した基板表面に酸化皮膜を容易かつ安価に形成することができ、スケールアップも容易である量子ドット構造を有する基板の製造方法を提供する。【解決手段】自然酸化膜を除去した基板表面を酸化処理する酸化工程と、粒子状のたんぱく質懸濁溶液を該基板に塗布してたんぱく質粒子を該基板上に二次元配列させる塗布工程とを有する量子ドット構造を有する基板の製造方法において、該酸化工程を、酸化性物質含有液を該基板に接触させることにより行うことを特徴とする量子ドット構造を有する基板の製造方法。【選択図】なし