ELECTRON BEAM LITHOGRAPHY DEVICE

PROBLEM TO BE SOLVED: To provide an electron beam lithography device that can secure a sufficient time for which an operation check of a deflection amplifier can be performed.SOLUTION: An electron beam lithography device includes a deflector for deflecting an electron beam to be incident to a sample...

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Bibliographic Details
Main Authors MUROFUSHI TATSUYA, TSUCHIYA SEIICHI, MINE AKIKANE
Format Patent
LanguageEnglish
Japanese
Published 22.08.2016
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Summary:PROBLEM TO BE SOLVED: To provide an electron beam lithography device that can secure a sufficient time for which an operation check of a deflection amplifier can be performed.SOLUTION: An electron beam lithography device includes a deflector for deflecting an electron beam to be incident to a sample, a first DA converter for outputting a voltage signal corresponding to an input signal from an output terminal to the deflector, a second DA converter which outputs a voltage signal corresponding to the input signal from an output terminal and is different from the first DA converter, a first cable for connecting the output terminal of the first DA converter and the deflector, a second cable which has one end connected to the output terminal of the second DA converter and whose impedance is substantially equal to the impedance of the first cable, a comparator for outputting a comparison result of the voltage signal from the first DA converter and the voltage signal from the second DA converter, and a diagnosis device for diagnosing the output of the first DA converter based on the output from the comparator.SELECTED DRAWING: Figure 3 【課題】偏向アンプの動作チェックを行うことが可能な時間を十分に確保する。【解決手段】電子線描画装置は、試料へ入射する電子線を偏向する偏向器と、入力信号に応じた電圧信号を出力端子から前記偏向器へ出力する第1のDA変換器と、前記入力信号に応じた電圧信号を出力端子から出力する、前記第1のDA変換器とは異なる第2のDA変換器と、前記第1のDA変換器の出力端子と前記偏向器とを接続する第1のケーブルと、一端が前記第2のDA変換器の出力端子に接続され、前記第1のケーブルとインピーダンスがほぼ等しい第2のケーブルと、前記第1のDA変換器からの電圧信号と、前記第2のDA変換器からの電圧信号を比較した結果を出力する比較器と、前記比較器からの出力に基づいて、前記第1のDA変換器の出力診断を行う診断装置と、を有する。【選択図】図3
Bibliography:Application Number: JP20150030531