ELECTROSPRAY DEVICE

PROBLEM TO BE SOLVED: To provide an electrospray device capable of improving productivity when forming a thin film on a main surface and a reverse surface of a substrate.SOLUTION: This electrospray device 100 comprises a nozzle 1 for atomizing a solution material 210 in a state of applying voltage t...

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Bibliographic Details
Main Authors ISHI KAZUTERU, HATAKEYAMA TATSUO, YAMAMOTO KIYOTO
Format Patent
LanguageEnglish
Japanese
Published 22.08.2016
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Summary:PROBLEM TO BE SOLVED: To provide an electrospray device capable of improving productivity when forming a thin film on a main surface and a reverse surface of a substrate.SOLUTION: This electrospray device 100 comprises a nozzle 1 for atomizing a solution material 210 in a state of applying voltage thereto, and a substrate 200 is supported in a state of exposing at least a main surface 200a and a reverse surface 200b, and the nozzle 1 includes a first nozzle 1a arranged on the main surface 200a side and a second nozzle 1b arranged on the reverse surface 200b side in a state of exposing at least the main surface 200a and the reverse surface 200b.SELECTED DRAWING: Figure 3 【課題】基板の主表面および裏面に薄膜を形成する際の生産性を向上させることが可能なエレクトロスプレー装置を提供する。【解決手段】このエレクトロスプレー装置100は、溶液材料210に電圧を印加した状態で噴霧するノズル1を備え、基板200は、少なくとも主表面200aおよび裏面200bが露出された状態で支持されており、ノズル1は、少なくとも主表面200aおよび裏面200bが露出された状態の主表面200a側に配置される第1ノズル1aと、裏面200b側に配置される第2ノズル1bとを含む。【選択図】図3
Bibliography:Application Number: JP20150028882