APPARATUS AND METHOD FOR MANUFACTURING METAL NITRIDE FILM FOR THERMISTOR

• Main Authors: SENBOKUYA KAZUAKI, CHITOSE NORIHISA
• Format: Patent
• Language: English; Japanese
• Published: 18.08.2016
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; RESISTORS; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

PROBLEM TO BE SOLVED: To provide an apparatus and a method for manufacturing a metal nitride film for thermistor that can form the metal nitride film for thermistor having uniform thermistor characteristics on an insulation film.SOLUTION: An apparatus for manufacturing a metal nitride film 3 for thermistor on an insulation film 2 comprises: a film conveyance mechanism 4 comprising a payoff roll 4a wound with a long belt-like insulation film in a rolled state, a take-up roll 4b for taking up the insulation film unwound from the payoff roll, and a driving source 4c for driving the payoff roll and take-up roll to rotate; a film formation roll 5 for supporting the insulation film unwound from the payoff roll on an outer peripheral surface 5a; and a sputtering target 6 arranged opposite the outer peripheral surface supporting the insulation film and filming a top surface of the insulation film on the outer peripheral surface with the metal nitride material for thermistor by sputtering, the film conveyance mechanism pressing the insulation film being conveyed against an outer peripheral surface of the film formation roll to adhere.SELECTED DRAWING: Figure 1 【課題】 絶縁性フィルム上に均一なサーミスタ特性のサーミスタ用金属窒化物膜を成膜可能なサーミスタ用金属窒化物膜の製造装置及び製造方法を提供すること。【解決手段】 絶縁性フィルム２上にサーミスタ用金属窒化物膜３を製造する装置であって、長尺で帯状の絶縁性フィルムがロール状に巻回される巻き出しロール４ａと巻き出しロールから繰り出される絶縁性フィルムを巻き取る巻き取りロール４ｂと巻き取りロールを回転駆動させる駆動源４ｃとを備えたフィルム搬送機構４と、巻き出しロールから繰り出される絶縁性フィルムを外周面５ａで支持する成膜ロール５と、絶縁性フィルムを支持する外周面に対向配置され外周面上の絶縁性フィルムの表面にサーミスタ用金属窒化物材料をスパッタリングにより成膜可能なスパッタリングターゲット６とを備え、フィルム搬送機構が、搬送する絶縁性フィルムを成膜ロールの外周面に押し当てて密着させる。【選択図】図１