ELECTROSTATIC CHUCK DEVICE
PROBLEM TO BE SOLVED: To provide an electrostatic chuck device that makes a temperature distribution of a plate-like sample uniform.SOLUTION: The electrostatic chuck device comprises an electrostatic chuck part which is formed of a ceramic sintered body as a forming material and has one main surface...
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Main Authors | , |
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Format | Patent |
Language | English Japanese |
Published |
08.08.2016
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Subjects | |
Online Access | Get full text |
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Summary: | PROBLEM TO BE SOLVED: To provide an electrostatic chuck device that makes a temperature distribution of a plate-like sample uniform.SOLUTION: The electrostatic chuck device comprises an electrostatic chuck part which is formed of a ceramic sintered body as a forming material and has one main surface as a mount surface for mounting a plate-like material; and cooling means for cooling the plate-like sample mounted on the mount surface. A plurality of projection parts supporting the plate-like sample are provided on the mount surface, and the cooling means supplies a heat transfer gas to between the plurality of projection parts, which have a plurality of first projection parts and a plurality of second projection parts shorter than the first projection parts. The plurality of first projection parts form a first region where the plurality of first projection parts gather on the mount surface, and are set to such a height that a flow of the heat transfer gas in the first region is a viscous flow, and the plurality of second projection parts form a second region where the plurality of second projection parts gather on the mount surface, and are set to such a height that a flow of the heat transfer gas in the second region is a molecular flow.SELECTED DRAWING: Figure 1
【課題】板状試料の温度分布を均一にする静電チャック装置の提供。【解決手段】セラミック焼結体を形成材料とし、一主面が板状試料を載置する載置面である静電チャック部と、前記載置面に載置された前記板状試料を冷却する冷却手段と、を備え、前記載置面には、前記板状試料を支持する複数の突起部が設けられ、前記冷却手段は、前記複数の突起部の間に伝熱ガスを供給し、前記複数の突起部は、複数の第1突起部と、前記第1突起部よりも低い複数の第2突起部と、を有し、前記複数の第1突起部は、前記載置面において前記複数の第1突起部が集まる第1領域を形成し、前記第1領域における前記伝熱ガスの流れが粘性流となる高さに設定され、前記複数の第2突起部は、前記載置面において前記複数の第2突起部が集まる第2領域を形成し、前記第2領域における前記伝熱ガスの流れが分子流となる高さに設定されている静電チャック装置。【選択図】図1 |
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Bibliography: | Application Number: JP20150018390 |