SUBSTRATE LIQUID PROCESSING APPARATUS AND SUBSTRATE LIQUID PROCESSING METHOD, AND COMPUTER READABLE STORAGE MEDIUM STORED WITH SUBSTRATE LIQUID PROCESSING PROGRAM

• Main Authors: SATO HIDEAKI, SATO TAKAZO
• Format: Patent
• Language: English; Japanese
• Published: 08.08.2016
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

PROBLEM TO BE SOLVED: To provide a substrate liquid processing apparatus that prevents a concentration sensor from getting out of order and so on and also prevents dust precipitating from the concentration sensor and so on from sticking on a substrate.SOLUTION: A substrate liquid processing apparatus according to the present invention includes: a processing liquid reservoir part (38) which reserves a processing liquid for processing a substrate (8); a processing liquid supply part (39) which supplies the processing liquid to the processing liquid reservoir part (38); a processing liquid circulation part (40) which circulates the processing liquid in the processing liquid reservoir part (38); a processing liquid discharge part (41) which branches off from the processing liquid circulation part (40) and discharges the processing liquid; a concentration sensor (61) which is provided for the processing liquid discharge part (41) and measures a concentration in the processing liquid; and a control part (7) which controls the processing liquid supply part. The control part is configured to circulate the processing liquid by the processing liquid circulation part; to discharge the circulated processing liquid from the processing liquid discharge part intermittently or continuously for a predetermined time at a predetermined timing; to supply a new processing liquid from the processing liquid supply part; and to make the concentration sensor measure the concentration in the discharged processing liquid at a predetermined timing.SELECTED DRAWING: Figure 2 【課題】基板液処理装置において、濃度センサの故障等を防止するとともに、濃度センサから析出等した塵が基板に付着するのを防止する。【解決手段】本発明では、基板(8)を処理するための処理液を貯留する処理液貯留部(38)と、処理液貯留部(38)に処理液を供給する処理液供給部(39)と、処理液貯留部(38)の内部の処理液を循環させる処理液循環部(40)と、処理液循環部(40)から分岐して処理液を排出させる処理液排出部(41)と、処理液排出部(41)に設けられ、処理液中の濃度を計測する濃度センサ(61)と、処理液供給部を制御する制御部(7)とを有し、制御部は、処理液循環部で処理液を循環させ、循環させた処理液を所定のタイミングで断続的に又は所定時間で連続的に処理液排出部から排出させるとともに、処理液供給部から新たな処理液を供給し、排出させた処理液について所定のタイミングで処理液中の濃度を濃度センサで計測させることにした。【選択図】図２