FILM DEPOSITION APPARATUS, AND MANUFACTURING METHOD OF CUTTING TOOL WITH COATING FILM

• Main Authors: SUDO TOSHIKATSU, SHIMBOYA ATSUSHI, KAWAMURA MASAO, MASUNO SATOYUKI
• Format: Patent
• Language: English; Japanese
• Published: 04.08.2016
• Subjects: BORING; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR; METALLURGY; PERFORMING OPERATIONS; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; TRANSPORTING; TURNING

PROBLEM TO BE SOLVED: To provide a film deposition apparatus capable of forming a high-quality coating film by stably keeping bias voltage in performing coating while rotating an article to be processed.SOLUTION: A film deposition apparatus includes a film deposition chamber having a film deposition region where a coating film is formed on an article to be coated, a transport device to transport a transport carrier to hold the article to be coated, and a bias power source to apply bias voltage to the article to be coated through the transport carrier. A plurality of rods that support the article to be coated and rotate around an axis are vertically arranged along the carrier transport direction in the transport carrier. A protruding member is attached on the outer peripheral surface of the rods, protruding to the outside in the radial direction. An interference part is installed on the wall of the film deposition chamber via an insulation member, the interference part catching the protruding member of the transport carrier moving in the film deposition chamber and rotating the rods around the axis. The interference part and the bias power source are electrically connected.SELECTED DRAWING: Figure 1 【課題】被処理物を回転させながらコーティングを行う際のバイアス電圧を安定に保持し、高品質のコーティング膜を形成することができる成膜装置を提供する。【解決手段】被成膜物にコーティング膜を形成する成膜領域を有する成膜室と、被成膜物を支持した搬送キャリアを搬送する搬送装置と、搬送キャリアを介して被成膜物にバイアス電圧を印加するバイアス電源とを備え、搬送キャリアには、被成膜物を支持して軸周りに回転する複数のロッドが起立姿勢でキャリア搬送方向に沿って配置され、ロッドの外周面に径方向外側へ突出する突出部材が設けられ、成膜室の壁面に、成膜室内を移動する搬送キャリアの突出部材を引っ掛けてロッドを軸周りに回転させる干渉部材が絶縁部材を介して設けられ、干渉部材とバイアス電源とは電気的に接続されている、成膜装置。【選択図】図１