POSITIVE PHOTOSENSITIVE RESIN COMPOSITION FOR PRODUCING MICROLENS PATTERN

PROBLEM TO BE SOLVED: To provide a positive photosensitive resin composition for producing a microlens pattern, which has both excellent resolution and a flow margin, and a production method of a microlens pattern and a production method of a microlens using the above composition.SOLUTION: The posit...

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Bibliographic Details
Main Authors ISOBE SHINGO, MATSUMOTO NAOZUMI, INOUE TOMOYUKI, TAKAHASHI KAZUKI
Format Patent
LanguageEnglish
Japanese
Published 25.07.2016
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CHEMISTRY
CINEMATOGRAPHY
COMPOSITIONS BASED THEREON
ELECTROGRAPHY
HOLOGRAPHY
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS
MATERIALS THEREFOR
METALLURGY
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
ORGANIC MACROMOLECULAR COMPOUNDS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
THEIR PREPARATION OR CHEMICAL WORKING-UP
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Summary:PROBLEM TO BE SOLVED: To provide a positive photosensitive resin composition for producing a microlens pattern, which has both excellent resolution and a flow margin, and a production method of a microlens pattern and a production method of a microlens using the above composition.SOLUTION: The positive photosensitive resin composition for producing a microlens pattern relating to the present invention comprises a resin (A) having an acid dissociable dissolution-inhibiting group and showing increase in the solubility with an alkali by an action of an acid, a compound (B) having at least two vinyloxy groups, and a photoacid generator (C). The resin (A) comprises a resin (A1) having a structural unit (a1) derived from hydroxystyrene and a structural unit (a2) based on a structural unit derived from hydroxystyrene in which a hydrogen atom in at least one hydroxyl group is replaced by a group containing an acid dissociable dissolution-inhibiting group.SELECTED DRAWING: None 【課題】優れた解像性及び広いフローマージンのいずれをも備えたマイクロレンズパターン製造用ポジ型感光性樹脂組成物並びにそれを用いたマイクロレンズパターンの製造方法及びマイクロレンズの製造方法を提供する。【解決手段】本発明に係るマイクロレンズパターン製造用ポジ型感光性樹脂組成物は、酸解離性溶解抑制基を有し、酸の作用によりアルカリに対する溶解性が増大する樹脂（Ａ）と、少なくとも２個のビニルオキシ基を有する化合物（Ｂ）と、光酸発生剤（Ｃ）とを含有し、上記樹脂（Ａ）は、ヒドロキシスチレンから誘導される構成単位（ａ１）と、ヒドロキシスチレンから誘導される構成単位における少なくとも１個の水酸基の水素原子が酸解離性溶解抑制基含有基で置換された構成単位（ａ２）とを有する樹脂（Ａ１）を含む。【選択図】なし
Bibliography:Application Number: JP20150009713