VISIBLE-LIGHT-RESPONSIVE PHOTOCATALYST CONFIGURATION AND METHOD FOR PRODUCING THE SAME

• Main Authors: HSIAO CHIEN-NAN, SHIAO MING-HUA, TSENG FAN-GANG, CHU NIEN-NAN, CHANG MAO-NAN, LIN JUN-TING
• Format: Patent
• Language: English; Japanese
• Published: 25.07.2016
• Subjects: CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; NANOTECHNOLOGY; PERFORMING OPERATIONS; PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL; SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; THEIR RELEVANT APPARATUS; TRANSPORTING

PROBLEM TO BE SOLVED: To provide a visible-light-responsive photocatalyst configuration and a method for producing the same.SOLUTION: The visible-light-responsive photocatalyst configuration is produced by going through Galvanic Replacement Reaction (GRR) by 2 times. The visible-light-responsive photocatalyst configuration has the characteristics such as a large surface group, a high surface activity, a high integrity with silicon substrate, and a high environmental tolerance, and the method has the characteristics such as a high speed and simplicity, a high reproducibility of production process consuming no unnecessary energy.SELECTED DRAWING: Figure 1 【課題】可視光応答型光触媒構成及びその製造方法を提供する。【解決手段】２回のガルバニ置換反応（Ｇａｌｖａｎｉｃ Ｒｅｐｌａｃｅｍｅｎｔ Ｒｅａｃｔｉｏｎ、ＧＲＲ）を経て可視光応答型光触媒構成を製造する。可視光応答型光触媒構成は大きな表面基、高い表面活性、シリコン基板との高い統合性、及び高い環境耐性という特性を有し、且つ高速且つ簡単であり、余計なエネルギーを費やさない製造工程の高い再現性という特性を有する。【選択図】図１