LITHOGRAPHIC APPARATUS

PROBLEM TO BE SOLVED: To provide an apparatus in which the occurrence of thermal expansion/contraction effects are reduced; and specifically, a system configured to reduce thermal expansion/contraction effects in an immersion system which uses a supply system which provides immersion fluid to a loca...

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Main Authors JOHANNES HENRICUS WILHELMUS JACOBS, NICOLAAS TEN KATE, REMIE MARINUS JAN, KNARREN BASTIAAN ANDREAS WILHELMUS HUBERTUS, ROBERT YAN VOGT, JOOST JEROEN OTTENS, LAURENT THIBAUD SIMON MATTHEW, KUNEN JOHANN GERTRUDIX CORNELIS, NINO GIOVANNI FRANCISCO
Format Patent
LanguageEnglish
Japanese
Published 30.06.2016
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:PROBLEM TO BE SOLVED: To provide an apparatus in which the occurrence of thermal expansion/contraction effects are reduced; and specifically, a system configured to reduce thermal expansion/contraction effects in an immersion system which uses a supply system which provides immersion fluid to a localized area of a substrate and/or substrate table.SOLUTION: A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent to the substrate supporting area.SELECTED DRAWING: Figure 9 【課題】熱膨張／熱収縮の影響が生じるのを低減する装置を提供する。具体的には、基板および／または基板テーブルの局部領域に液浸流体を供給する供給システムを使用する液浸システムにおける熱膨張／熱収縮の影響を低減するように構成されたシステムを提供する。【解決手段】基板サポート領域上に基板を支持し、基板サポート領域に隣接する表面上にヒータおよび／または温度センサを支持するように構成された基板テーブルを含むリソグラフィ装置が開示される。【選択図】図９
Bibliography:Application Number: JP20160048567