SUBSTRATE LIQUID PROCESSING APPARATUS

• Main Authors: KOMIYA YOJI, TANAKA KOJI, UMENO SHINICHI, SATO TAKAZO, ANAMOTO ATSUSHI, TAKAGI YASUHIRO
• Format: Patent
• Language: English; Japanese
• Published: 23.06.2016
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

PROBLEM TO BE SOLVED: To provide a substrate liquid processing apparatus capable of space saving.SOLUTION: A substrate liquid processing apparatus according to one aspect of an embodiment includes a transport unit, a processing unit, a reservoir, and a feeding mechanism. A transport device for transporting a substrate is arranged in the transport unit. A liquid processing unit, contiguous to the transport unit in the horizontal direction and processing the wafer by using process liquid, is arranged in the processing unit. The reservoir reserves the process liquid. The feeding mechanism feeds the process liquid, reserved in the reservoir, to the liquid processing unit. The reservoir is arranged directly under the transport unit. The feeding mechanism is arranged directly under the processing unit.SELECTED DRAWING: Figure 5 【課題】省スペース化を図ることのできる基板液処理装置を提供すること。【解決手段】実施形態の一態様に係る基板液処理装置は、搬送部と、処理部と、貯留部と、送液機構とを備える。搬送部は、基板を搬送する搬送装置が配置される。処理部は、搬送部に水平方向に隣接し、処理液を用いて基板を処理する液処理ユニットが配置される。貯留部は、処理液を貯留する。送液機構は、貯留部に貯留された処理液を液処理ユニットへ送り出す。貯留部は、搬送部の直下に配置される。また、送液機構は、処理部の直下に配置される。【選択図】図５