CLEANING LIQUID, METHOD OF CLEANING PIPELINE OF FILM FORMING APPARATUS BY COATING
PROBLEM TO BE SOLVED: To provide a cleaning liquid capable of cleaning and removing a siloxane gel deposited and adhered in a pipeline of a film forming apparatus by coating which is derived from a silicon-containing film material such as a silicon-containing resist under layer film material, and no...
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Main Authors | , , |
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Format | Patent |
Language | English Japanese |
Published |
23.06.2016
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Subjects | |
Online Access | Get full text |
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Summary: | PROBLEM TO BE SOLVED: To provide a cleaning liquid capable of cleaning and removing a siloxane gel deposited and adhered in a pipeline of a film forming apparatus by coating which is derived from a silicon-containing film material such as a silicon-containing resist under layer film material, and not generating precipitates and pipeline clog even if contacting with an organic material in the film forming apparatus by coating.SOLUTION: The cleaning liquid used when removing a siloxane gel adhered in a pipeline of a film forming apparatus by coating comprises an alcohol solution of tetraalkylammonium hydroxide or choline.SELECTED DRAWING: None
【課題】塗布成膜装置の配管内にて析出、固着したケイ素含有レジスト下層膜材料等のケイ素含有膜材料由来のシロキサンゲルを洗浄除去することができ、かつ塗布成膜装置内で有機系材料と接触しても沈殿や配管閉塞の発生しない洗浄液を提供する。【解決手段】塗布成膜装置の配管内に固着したシロキサンゲルを除去する際に用いる洗浄液であって、水酸化テトラアルキルアンモニウム又はコリンのアルコール溶液であることを特徴とする洗浄液。【選択図】なし |
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Bibliography: | Application Number: JP20140250913 |