SMALL-SIZED DEVICE MAINTENANCE MECHANISM

• Main Authors: OGISO HISATO, KAMEI RYUICHIRO, SUN YU, NAKANO ZEN, YABUTA YUKI, MIZUGUCHI HISASHI, HARA SHIRO, KATO AKIHIKO, WU ZHENG-QING
• Format: Patent
• Language: English; Japanese
• Published: 20.06.2016
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

PROBLEM TO BE SOLVED: To provide a film deposition apparatus suitable for deposition of an extremely small wafer such as a half-inch size, capable of improving maintainability in a chamber; and to provide a processing unit for a minimal fabrication system.SOLUTION: A film deposition apparatus includes a sputtering source 31, a chamber 34 provided oppositely to the sputtering source 31, and a drawing body 35 mounted drawably from the chamber 34, and has a constitution in which the drawing body 35 has a deposition prevention plate for covering at least a part of the inside of the chamber 34 in the mounted state in the chamber 34.SELECTED DRAWING: Figure 3 【課題】ハーフインチサイズのようなきわめて小さいウェハの成膜に適し、チャンバ内のメンテナンス性が向上する成膜装置および、ミニマルファブシステム用処理装置を提供する。【解決手段】本発明は、スパッタ源３１と、スパッタ源３１に対向して設けたチャンバ３４と、チャンバ３４から引き出し可能に取り付けた引き出し体３５と、を具備し、引き出し体３５は、チャンバ３４内に取り付けた状態で、チャンバ３４内の少なくとも一部を覆う防着板を有した構成である。【選択図】図３