SUBSTRATE STAGE

PROBLEM TO BE SOLVED: To provide a substrate stage capable of exposing an edge region of a substrate while a liquid immersion region is formed well when subjecting the edge region to liquid immersion exposure.SOLUTION: A substrate stage can be moved while holding a substrate as an exposure object. T...

Full description

Saved in:
Bibliographic Details
Main Authors IMAI MOTOMASA, NAGASAKA HIROYUKI, KUDO YOSHIHIKO, KONO HIROTAKA, TAKAIWA HIROAKI, NEI MASAHIRO, SHIRAISHI KENICHI, YAMATO SOICHI, UMAGOME NOBUTAKA, INOUE JIRO, HIRUKAWA SHIGERU, NISHII YASUFUMI
Format Patent
LanguageEnglish
Japanese
Published 16.06.2016
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
Online AccessGet full text

Cover

More Information
Summary:PROBLEM TO BE SOLVED: To provide a substrate stage capable of exposing an edge region of a substrate while a liquid immersion region is formed well when subjecting the edge region to liquid immersion exposure.SOLUTION: A substrate stage can be moved while holding a substrate as an exposure object. The substrate stage comprises: a first circumferential wall; a second circumferential wall formed inside the first circumferential wall; and a support part formed inside the second circumferential wall. The substrate stage holds the substrate to the support part by setting space surrounded by the second circumferential wall at negative pressure.SELECTED DRAWING: Figure 4 【課題】基板のエッジ領域を液浸露光する場合に良好に液浸領域を形成した状態で露光できる基板ステージを提供する。【解決手段】基板ステージは、被露光対象としての基板を保持して移動可能である。基板ステージは、第１周壁と、第１周壁の内側に形成された第２周壁と、第２周壁の内側に形成された支持部とを備え、第２周壁に囲まれた空間を負圧にすることによって、支持部に基板を保持する。【選択図】図４
Bibliography:Application Number: JP20160043921