EXHAUST GAS PURIFICATION SYSTEM AND METHOD OF CONTROLLING EXHAUST GAS PURIFICATION SYSTEM

• Main Authors: TANIOKA KENICHI, WATANABE MASANORI
• Format: Patent
• Language: English; Japanese
• Published: 16.06.2016
• Subjects: BASIC ELECTRIC ELEMENTS; BLASTING; ELECTRICITY; ENGINE PLANTS IN GENERAL; GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR INTERNALCOMBUSTION ENGINES; GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR MACHINES ORENGINES IN GENERAL; HEATING; LIGHTING; MACHINES OR ENGINES IN GENERAL; MECHANICAL ENGINEERING; PERFORMING OPERATIONS; PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL; PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSIONOF CHEMICAL INTO ELECTRICAL ENERGY; SEPARATION; STEAM ENGINES; TRANSPORTING; WEAPONS

PROBLEM TO BE SOLVED: To provide an exhaust gas purification system and a control method for the same capable of preventing occurrence of clogging and breakage of a reducer injection valve caused by solidification of reducer, and preventing degradation of efficiency in reducer recovery processing and purification of exhaust gas.SOLUTION: In an exhaust gas purification system and a control method for the same, an injection valve temperature of a reducer injection valve is detected according to detection of the turning off of an ignition switch for stopping an internal combustion engine. A concentration and a solidification temperature of an urea aqueous solution adhering to an outer side and an inner side of an injection plate of the reducer injection valve are calculated on the basis of the injection valve temperature. Thus a stand-by time for starting the reducer recovering processing is calculated, and the reducer recovery processing is permitted under a condition that the stand-by time has passed.SELECTED DRAWING: Figure 5 【課題】還元剤の固化に起因した還元剤噴射弁の詰まりや破損等の発生を回避し、還元剤回収処理及び排気浄化の効率の低下を防止し得る排気浄化システム及びその制御方法を提供する。【解決手段】本発明の一態様に係る排気浄化システム及びその制御方法は、内燃機関を停停止するためのイグニッションスイッチのオフの検出に応じて還元剤噴射弁の噴射弁温度を検出し、還元剤噴射弁が備える噴射板の外部側及び内部側に付着した尿素水溶液の濃度及び固化温度を噴射弁温度に基づいて算定することにより還元剤回収処理を開始するまでの待ち時間を算定し、待ち時間の経過を条件として還元剤回収処理を許可する構成を備える。【選択図】図５