EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR PRODUCING DEVICE

• Main Authors: NAGASAKA HIROYUKI, YAMATO SOICHI, NISHII YASUFUMI
• Format: Patent
• Language: English; Japanese
• Published: 12.05.2016
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

PROBLEM TO BE SOLVED: To provide an exposure apparatus in which, when exposure treatment is performed in such a state that a liquid immersion area is formed between a projection optical system and a substrate, the liquid immersion area can be formed stably, a liquid to be used in the liquid immersion area can be recovered excellently, and exposure treatment can be performed precisely by preventing the liquid from flowing out to the surroundings or scattering.SOLUTION: The exposure apparatus is constituted so that an image of a predetermined pattern is projected onto a substrate through the liquid and the substrate thus projected is exposed. The exposure apparatus includes: a projection optical system for projecting the image of the predetermined pattern onto the substrate; a liquid supply mechanism for supplying the liquid onto the substrate in order that the liquid immersion area including a projection area of the projection optical system is formed on a part of the substrate; and a liquid recovery mechanism for simultaneously recovering the liquid on the substrate at several positions in the projection area, which positions are separated from one another in several different directions.SELECTED DRAWING: Figure 4 【課題】投影光学系と基板との間に液浸領域を形成した状態で露光処理する際、液浸領域を安定して形成できるとともにこの液体を良好に回収でき、周辺への液体の流出や飛散等を防止して精度良く露光処理できる露光装置を提供する。【解決手段】露光装置は、所定パターンの像を液体を介して基板に投影することによって基板を露光する。露光装置は、パターンの像を基板に投影する投影光学系と、投影光学系の投影領域を含む基板上の一部に液浸領域を形成するために基板上に液体を供給する液体供給機構と、投影領域に対して異なる複数の方向に離れた複数の位置で基板上の液体の回収を同時に行う液体回収機構とを備える。【選択図】図４