OPTICAL IMAGING DEVICE AND METHOD

PROBLEM TO BE SOLVED: To provide an optical imaging device and an optical imaging method technology for microlithography.SOLUTION: An optical imaging device comprises at least one optical element 109 and at least one holding device 104 connected to the optical element 109, wherein: the holding devic...

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Bibliographic Details
Main Authors GELLRICH BERNHARD, KUGLER JENS, HEMBACHER STEFAN
Format Patent
LanguageEnglish
Japanese
Published 12.05.2016
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Summary:PROBLEM TO BE SOLVED: To provide an optical imaging device and an optical imaging method technology for microlithography.SOLUTION: An optical imaging device comprises at least one optical element 109 and at least one holding device 104 connected to the optical element 109, wherein: the holding device 104 holds the optical element 109; a first part 109.1 of the optical element 109 contacts a first atmosphere; and a second part 109.2 of the optical element 109 at least temporarily contacts a second atmosphere. There is provided a reduction device 115 at least reducing dynamic fluctuations in the pressure difference between the first atmosphere and the second atmosphere.SELECTED DRAWING: Figure 2 【課題】マイクロリソグラフィのための光学撮像装置と光学撮像方法技術を提供する。【解決手段】少なくとも1つの光学素子109と、光学素子109に結合された少なくとも1つの保持装置104を備え、保持装置104は光学素子109を保持し、光学素子109の第1部分109.1は、第1雰囲気に接触し、光学素子109の第2部分109.2は、すくなくとも一時的には第2雰囲気に接触する。第1雰囲気と第2雰囲気間の圧力差における動的変動を少なくとも削減する削減装置115を備える。【選択図】図2
Bibliography:Application Number: JP20150230231