COATING TYPE COMPOSITION FOR FORMING BPSG FILM, SUBSTRATE, AND METHOD FOR FORMING PATTERN

• Main Authors: KIKUCHI RIE, TANEDA YOSHINORI, OGIWARA TSUTOMU, TACHIBANA SEIICHIRO
• Format: Patent
• Language: English; Japanese
• Published: 12.05.2016
• Subjects: ADHESIVES; APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CHEMICAL PAINT OR INK REMOVERS; CHEMISTRY; CINEMATOGRAPHY; COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS; COMPOSITIONS BASED THEREON; CORRECTING FLUIDS; DYES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; FILLING PASTES; HOLOGRAPHY; INKS; MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS; MATERIALS THEREFOR; METALLURGY; MISCELLANEOUS APPLICATIONS OF MATERIALS; MISCELLANEOUS COMPOSITIONS; NATURAL RESINS; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PAINTS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; POLISHES; SEMICONDUCTOR DEVICES; THEIR PREPARATION OR CHEMICAL WORKING-UP; USE OF MATERIALS THEREFOR; WOODSTAINS

PROBLEM TO BE SOLVED: To provide a coating-type composition for forming a BPSG film excellent in adhesion in a fine pattern, capable of wet-etching easily with a stripping liquid which does not damage a coating type organic film necessary for a semiconductor substrate and a patterning process, and a CVD film composed mainly of carbon, capable of maintaining releasability even after dry etching, and further capable of suppressing the generation of particles as forming by a coating process.SOLUTION: The coating-type composition for forming BPSG film includes: a compound having not less than one of structures composed of silicone as a skeleton represented by the formulae (1), not less than one of structures composed of phosphoric acid as a skeleton, not less than one of structures composed of boric acid as a skeleton, not less than one of structures composed of silicone as a skeleton, and a silicon-silicon bond.SELECTED DRAWING: None 【課題】微細パターンにおける密着性に優れ、半導体基板やパターニング工程で必要な塗布型有機膜や炭素を主成分とするＣＶＤ膜に対してダメージを与えない剥離液で容易にウエットエッチング可能であり、また、ドライエッチング後も剥離性を維持でき、さらに塗布プロセスで形成することでパーティクルの発生を抑制できるＢＰＳＧ膜を形成するための塗布型ＢＰＳＧ膜形成用組成物を提供する。【解決手段】式（１）で示されるケイ酸を骨格とする構造のうち１種類以上，リン酸を骨格とする構造のうち１種類以上，ホウ酸を骨格とする構造のうち１種類以上，及びケイ素を骨格とする構造のうち１種類以上を有し，かつケイ素−ケイ素連結を有する化合物を含む塗布型ＢＰＳＧ膜形成用組成物。【選択図】なし