METHOD OF MANUFACTURING SUBSTRATE, METHOD OF MANUFACTURING SUBSTRATE WITH MULTILAYER REFLECTION FILM, METHOD OF MANUFACTURING MASK BLANK, AND METHOD OF MANUFACTURING TRANSFER MASK

• Main Authors: SHOKI TSUTOMU, ORIHARA TOSHIHIKO
• Format: Patent
• Language: English; Japanese
• Published: 09.05.2016
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS; CHEMISTRY; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; GLASS; HOLOGRAPHY; INFORMATION STORAGE; INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER; JOINING GLASS TO GLASS OR OTHER MATERIALS; MATERIALS THEREFOR; METALLURGY; MINERAL OR SLAG WOOL; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS; SURFACE TREATMENT OF GLASS

PROBLEM TO BE SOLVED: To provide a method of manufacturing a substrate capable of manufacturing a substrate of low defect and high smoothness, and to provide a method of manufacturing a substrate with a multilayer reflection film, a method of manufacturing a mask blank, and a method of manufacturing a transfer mask.SOLUTION: For a substrate composed of a material containing an oxide, the processing reference surface of a catalyst material and the principal surface are brought into contact or approached, while interposing the process fluid, and catalyst reference etching of the principal surface is performed by moving the principal surface and processing reference surface relatively. The process fluid contains an organic alkaline aqueous solution.SELECTED DRAWING: Figure 4 【課題】低欠陥で高平滑な基板を製造することのできる基板の製造方法、多層反射膜付き基板の製造方法、マスクブランクの製造方法、及び、転写用マスクの製造方法を提供する。【解決手段】酸化物を含む材料からなる基板に対して、処理流体を介在させた状態で、触媒物質の加工基準面と前記主表面を接触又は接近させ、前記主表面と前記加工基準面とを相対運動させることにより前記主表面を触媒基準エッチングする。処理流体は、有機アルカリ水溶液を含む。【選択図】図４