INNER LAYER MEASUREMENT METHOD AND APPARATUS
PROBLEM TO BE SOLVED: To provide an inner layer measurement apparatus and method with higher space resolution than the prior art.SOLUTION: The inner layer measurement method for measuring an XY cross section of a translucent body which reflects a beam of light at a surface and an inner layer by mean...
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Main Authors | , , , |
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Format | Patent |
Language | English Japanese |
Published |
09.05.2016
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Subjects | |
Online Access | Get full text |
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Summary: | PROBLEM TO BE SOLVED: To provide an inner layer measurement apparatus and method with higher space resolution than the prior art.SOLUTION: The inner layer measurement method for measuring an XY cross section of a translucent body which reflects a beam of light at a surface and an inner layer by means of an optical interferometer, includes the steps of: measuring a first XY cross section of the translucent body by irradiating a first irradiation light; and measuring a second XY cross section which is positioned at inner layer than the first XY cross section by irradiating a second irradiation light which has the peak wavelength at longer-wavelength side than the first irradiation light.SELECTED DRAWING: Figure 1
【課題】従来よりも空間分解能の高い内層測定装置および方法を提供すること。【解決手段】本開示における解決手段は、光を表面および内層で反射する半透明体のXY断面を光干渉計により測定する内層測定方法であって、第1照射光を照射して前記半透明体の第1XY断面を測定する工程と、前記第1照射光よりも長波長側にピーク波長を有する第2照射光を照射して前記第1XY断面よりも内層に位置する第2XY断面を測定する工程と、を含むことを特徴とする内層測定方法に関するものである。【選択図】図1 |
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Bibliography: | Application Number: JP20140202747 |