OZONE SUPPLY DEVICE, OZONE SUPPLY METHOD, CHARGED PARTICLE BEAM DRAWING SYSTEM AND CHARGED PARTICLE BEAM DRAWING METHOD

• Main Authors: YAMANAKA YOSHIRO, TANEDA YASUYUKI
• Format: Patent
• Language: English; Japanese
• Published: 28.04.2016
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

PROBLEM TO BE SOLVED: To provide an ozone supply device capable of supplying high-concentration ozone gas.SOLUTION: An ozone supply device has an ozone generator for generating ozone gas to be supplied to a vacuum device, a first flow rate control mechanism for controlling the flow rate of the ozone gas generated in the ozone generator, a second flow rate control mechanism for controlling the flow rate of the ozone gas to be supplied to the vacuum device, and a main pipe which is provided at the secondary side of the first flow rate control mechanism and at the primary side of the second flow rate control mechanism and to which the ozone gas is introduced at a flow rate which is controlled by the first flow rate control mechanism so that the internal pressure is lower than the atmosphere pressure.SELECTED DRAWING: Figure 1 【課題】高濃度のオゾンガスを供給することができるオゾン供給装置を提供すること。【解決手段】本発明の一態様に係るオゾン供給装置は、真空装置に供給されるオゾンガスを生成するオゾン発生器と、前記オゾン発生器により生成された前記オゾンガスの流量を制御する第１の流量制御機構と、前記真空装置に供給される前記オゾンガスの流量を制御する第２の流量制御機構と、前記第１の流量制御機構の二次側で、前記第２の流量制御機構の一次側に設けられ、前記第１の流量制御機構により内部圧力が大気圧より低くなるように制御された流量で前記オゾンガスが導入される主配管と、を具備する。【選択図】図１