METHOD OF FORMING THIN FILM PIEZOELECTRIC ELEMENT, PIEZOELECTRIC ACTUATOR, MICROPUMP, DROPLET DISCHARGE HEAD, INK CARTRIDGE, AND IMAGE FORMATION DEVICE
PROBLEM TO BE SOLVED: To prevent thinning (edge bead) of a thin film piezoelectric element at the outer peripheral edge of a wafer, and occurrence of crack caused by uneven thickness of the edge, by a simple method when forming a thin film piezoelectric element by a spin coating method.SOLUTION: A P...
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Format | Patent |
Language | English Japanese |
Published |
21.04.2016
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Subjects | |
Online Access | Get full text |
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Summary: | PROBLEM TO BE SOLVED: To prevent thinning (edge bead) of a thin film piezoelectric element at the outer peripheral edge of a wafer, and occurrence of crack caused by uneven thickness of the edge, by a simple method when forming a thin film piezoelectric element by a spin coating method.SOLUTION: A PZT film 143 is formed on a wafer 10 by repeating a process for applying a sol-gel solution forming the PZT film 143 on a lower electrode 141, while rotating the wafer 10 on which a diaphragm 123 and the lower electrode 141 are formed, and calcining after application of the sol-gel solution. A step for removing the sol-gel solution thus applied by scattering a rinse liquid 14 to the outer peripheral edge 10a of the wafer 10 is included before ending application of a thin film formation agent to the outer peripheral edge 10a of the wafer 10.SELECTED DRAWING: Figure 1
【課題】スピンコート法による薄膜圧電素子の形成に際し、ウエハーの外周縁部での薄膜圧電素子の厚膜化(エッジビード)、およびエッジ部の膜厚ムラに起因するクラックの発生を、簡単な方法で防止する【解決手段】振動板123、および下部電極141を重ねて形成したウエハー10を回転させつつ、下部電極141にPZT膜143を形成するゾルゲル液を塗布し、ゾルゲル液の塗布後において焼成する工程を繰り返して、ウエハー10にPZT膜143を形成する。ウエハー10の外周縁部10aへの薄膜形成剤の塗布が終了する前に、外周縁部10aにリンス液14を散布して塗布したゾルゲル液を除去する工程を含む。【選択図】図1 |
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Bibliography: | Application Number: JP20140186422 |