PROTECTIVE FILM, FILM LAMINATE AND POLARIZING PLATE

PROBLEM TO BE SOLVED: To provide a protective film having a low moisture permeability and self-supporting property in a thin layer state, which can prevent moisture absorption in a polarizing film even in a high-temperature and high-humidity environment when laminated with the polarizing film, and c...

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Main Authors KATO MASAHISA, SUZUKI MASAYASU, MURATA TSUTOMU, KUWABARA MASAOMI, MURATA AKIRA, GOTO MAKOTO
Format Patent
LanguageEnglish
Japanese
Published 31.03.2016
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Summary:PROBLEM TO BE SOLVED: To provide a protective film having a low moisture permeability and self-supporting property in a thin layer state, which can prevent moisture absorption in a polarizing film even in a high-temperature and high-humidity environment when laminated with the polarizing film, and can suppress elongation and contraction of the polarizing film.SOLUTION: The protective film is formed of a repeating unit having a structure derived from urethane (meth)acrylate as a monomer, in which the repeating unit includes a branched alkyl group in the main chain and preferably includes a branched alkyl group having 2 or more branches. The repeating unit includes a saturated cyclic aliphatic group and further includes amide structures or ether structures sandwiching the branched alkyl group.SELECTED DRAWING: None 【課題】偏光フィルムに貼合せた場合、高温高湿環境下であっても、偏光フィルムが吸湿し難く、偏光フィルムの伸縮を抑制できる薄層の状態で透湿度が低く、自立性のある保護フィルムを提供する。【解決手段】モノマーであるウレタン(メタ)アクリレート由来の構造を有する繰り返し単位によって形成され、上記繰り返し単位は主鎖に分岐鎖状アルキル基を有しており、好ましくは分岐数が2以上の分岐鎖状アルキル基を有する保護フィルム。繰り返し単位に飽和環状脂肪族基を有し、更に分岐鎖状アルキル基を挟む形でアミド構造又はエーテル構造を含む保護フィルム。【選択図】なし
Bibliography:Application Number: JP20140165304