ELECTRODE STRUCTURE OF SILICON PHOTONICS MODULATOR

PROBLEM TO BE SOLVED: To provide an electrode structure of a small silicon photonics modulator with multichannel and high density to cause the silicon photonics modulator to perform high-speed operation at a high frequency.SOLUTION: An electrode structure of a silicon photonics modulator includes on...

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Bibliographic Details
Main Authors SUZUKI YASUYUKI, YASHIKI KENICHIRO
Format Patent
LanguageEnglish
Japanese
Published 10.03.2016
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Summary:PROBLEM TO BE SOLVED: To provide an electrode structure of a small silicon photonics modulator with multichannel and high density to cause the silicon photonics modulator to perform high-speed operation at a high frequency.SOLUTION: An electrode structure of a silicon photonics modulator includes on a silicon substrate plane surface: a first layer for forming a plurality of bias electrical wiring; and a second layer formed by positioning each of a plurality of ground electrode parts with the wiring of the first layer, respectively.SELECTED DRAWING: Figure 7A 【課題】多チャンネル且つ高密度の小型シリコンフォトニクス変調器の電極構造を提供して、当該シリコンフォトニクス変調器を高周波で高速動作させること。【解決手段】本発明のシリコンフォトニクス変調器の電極構造は、シリコン基板平面上に、複数のバイアス電気配線を形成するための第1層と、複数のグランド電極部を、それぞれ第1層の電気配線と位置合わせして形成した第2層とを備える。【選択図】図7A
Bibliography:Application Number: JP20140156246