EXPOSURE DEVICE AND CLEANING METHOD

PROBLEM TO BE SOLVED: To provide: an exposure device having a function that can remove carbon based contaminated substances with a high efficiency and at a high speed, the carbon based contaminated substances being deposited on an optical system element of a reflection type exposure device with the...

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Bibliographic Details
Main Author WATANABE GENTA
Format Patent
LanguageEnglish
Japanese
Published 07.03.2016
Subjects
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