EXPOSURE DEVICE AND CLEANING METHOD
PROBLEM TO BE SOLVED: To provide: an exposure device having a function that can remove carbon based contaminated substances with a high efficiency and at a high speed, the carbon based contaminated substances being deposited on an optical system element of a reflection type exposure device with the...
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Main Author | |
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Format | Patent |
Language | English Japanese |
Published |
07.03.2016
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Subjects | |
Online Access | Get full text |
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