EXPOSURE DEVICE AND CLEANING METHOD

• Main Author: WATANABE GENTA
• Format: Patent
• Language: English; Japanese
• Published: 07.03.2016
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

PROBLEM TO BE SOLVED: To provide: an exposure device having a function that can remove carbon based contaminated substances with a high efficiency and at a high speed, the carbon based contaminated substances being deposited on an optical system element of a reflection type exposure device with the use of the reflection type exposure device; and a cleaning method of the optical system element.SOLUTION: There are provided an exposure device and a cleaning method of the exposure device. The exposure device includes: a cleaning light source comprising an ultraviolet ray; a mechanism jetting gas containing a substance exhibiting paramagnetism or diamagnetism into the exposure device; and magnetic poles for adsorbing a carbon compound having been magnetized in the exposure device by the light source and the mechanism.SELECTED DRAWING: Figure 1 【課題】本発明は、反射型露光装置の使用に伴いその光学系素子に堆積していく、炭素系汚染物質を効率よく、高速に除去することができる機能を備えた露光装置、およびその光学系素子の洗浄方法を提供することである。【解決手段】紫外線からなる洗浄用光源と、常磁性、もしくは反磁性を示す物質を含む気体を前記露光装置内に噴射する機構と、それらにより前記露光装置内で磁化された炭素化合物を吸着するための磁極とを具備することを特徴とする露光装置と、その洗浄方法である。【選択図】 図１