DEVELOPING METHOD, DEVELOPING DEVICE, AND COMPUTER-READABLE RECORDING MEDIUM

• Main Authors: IZEKI TOSHIHIRO, TAKEGUCHI HIROSHI, TERASHITA YUICHI
• Format: Patent
• Language: English; Japanese
• Published: 07.03.2016
• Subjects: APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL; BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; INFORMATION AND COMMUNICATION TECHNOLOGY [ICT] SPECIALLY ADAPTEDFOR SPECIFIC APPLICATION FIELDS; PERFORMING OPERATIONS; PHYSICS; PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL; SEMICONDUCTOR DEVICES; SPRAYING OR ATOMISING IN GENERAL; TRANSPORTING

PROBLEM TO BE SOLVED: To improve uniformity of an in-plane line width distribution.SOLUTION: A developing method is provided, which comprises developing a resist film R disposed on a surface Wa of a wafer W and exposed to form a resist pattern. The method includes: a step in which, while rotating the wafer W around a rotation axis extending in a direction orthogonal to the surface Wa of the wafer W that is horizontally held, a developer L is discharged from a discharge port Na of a liquid contact member N located above the wafer W onto the resist film R so as to spread the developer L on the surface of the resist film R; and a step in which the liquid contact member N having a lower end face Nb opposing to the surface Wa of the wafer W is disposed above an advance region in the surface Wa of the wafer W, where supply of the developer L from the liquid contact member N is carried out earlier.SELECTED DRAWING: Figure 8 【課題】面内線幅分布の均一性を向上させる。【解決手段】現像方法は、ウエハＷの表面Ｗａ上に配置され且つ露光されたレジスト膜Ｒを現像してレジストパターンを形成する現像方法であって、水平に保持されたウエハＷの表面Ｗａに直交する方向に延びている回転軸の周りにウエハＷを回転させつつ、ウエハＷの上方に位置する接液部材Ｎの吐出口Ｎａから現像液Ｌをレジスト膜Ｒ上に吐出して、レジスト膜Ｒの表面上に現像液Ｌを行き渡らせる工程と、ウエハＷの表面Ｗａと対向する下端面Ｎｂを有する接液部材Ｎを、ウエハＷの表面Ｗａのうち接液部材Ｎからの現像液Ｌの供給が先行した領域である先行領域の上方に配置する工程とを含む。【選択図】図８